Hāʻawi pololei ka hale hana i ka Resonant Capacitor - High-Current Film Capacitor Snubber no ka Mīkini Welding (SMJ-TC) – CRE
Hāʻawi pololei ʻo Factory Resonant Capacitor - High-Current Film Capacitor Snubber no Welding Machine (SMJ-TC) – CRE Detail:
ʻikepili ʻenehana
Laulā wela hana | Max.Operating wela., luna, max: + 85 ℃ Wehewela waeʻano kiʻekiʻe: +85 ℃ Wehewela māhele haʻahaʻa: -40 ℃ |
kaha kaha | 0.22~3μF |
Volta koho | 3000V.DC~10000V.DC |
Cap.tol | ±5%(J) ;±10%(K) |
E kū i ka uila | 1.35Un DC/10S |
Ka mea hoopau | tgδ≤0.001 f=1KHz |
Kūleʻa hoʻokaʻawale | C≤0.33μF RS≥15000 MΩ (ma 20 ℃ 100V.DC 60S) C>0.33μF RS*C≥5000S (ma 20 ℃ 100V.DC 60S) |
Kāohi i kēia manawa | ʻike i ka ʻikepili |
Manaolana ola | 100000h(Un; Θhotspot≤70°C) |
Kūlana kuhikuhi | IEC 61071 ; |
Hiʻona
1. Lipine Mylar, Hoʻopaʻa ʻia me ka resin;
2. Ke alakai hua hua keleawe;
3. Kū'ē i ka volta kiʻekiʻe, haʻahaʻa tgδ, piʻi haʻahaʻa haʻahaʻa;
4. haʻahaʻa ESL a me ESR;
5. Kiʻekiʻe pulse kēia manawa.
Palapala noi
1. GTO Snubber.
2. Hoʻohana nui ʻia i nā lako uila mana i ka wā o ka peak voltage, peak absorption protection.
Kaapuni maʻamau
kaha kiʻi
Hōʻike
Un=3000V.DC | |||||||
Kahakaha (μF) | φD (mm) | L(mm) | L1(mm) | ESL(nH) | dv/dt(V/μS) | Ipk(A) | Irms(A) |
0.22 | 35 | 44 | 52 | 25 | 1100 | 242 | 30 |
0.33 | 43 | 44 | 52 | 25 | 1000 | 330 | 35 |
0.47 | 51 | 44 | 52 | 22 | 850 | 399 | 45 |
0.68 | 61 | 44 | 52 | 22 | 800 | 544 | 55 |
1 | 74 | 44 | 52 | 20 | 700 | 700 | 65 |
1.2 | 80 | 44 | 52 | 20 | 650 | 780 | 75 |
1.5 | 52 | 70 | 84 | 30 | 600 | 900 | 45 |
2.0 | 60 | 70 | 84 | 30 | 500 | 1000 | 55 |
3.0 | 73 | 70 | 84 | 30 | 400 | 1200 | 65 |
4.0 | 83 | 70 | 84 | 30 | 350 | 1400 | 70 |
Un=6000V.DC | |||||||
Kahakaha (μF) | φD (mm) | L(mm) | L1(mm) | ESL(nH) | dv/dt(V/μS) | Ipk(A) | Irms(A) |
0.22 | 43 | 60 | 72 | 25 | 1500 | 330 | 35 |
0.33 | 52 | 60 | 72 | 25 | 1200 | 396 | 45 |
0.47 | 62 | 60 | 72 | 25 | 1000 | 470 | 50 |
0.68 | 74 | 60 | 72 | 22 | 900 | 612 | 60 |
1 | 90 | 60 | 72 | 22 | 800 | 900 | 75 |
Un=7000V.DC | |||||||
Kahakaha (μF) | φD (mm) | L(mm) | L1(mm) | ESL(nH) | dv/dt(V/μS) | Ipk(A) | Irms(A) |
0.22 | 45 | 57 | 72 | 25 | 1100 | 242 | 30 |
0.68 | 36 | 80 | 92 | 28 | 1000 | 680 | 25 |
1.0 | 43 | 80 | 92 | 28 | 850 | 850 | 30 |
1.5 | 52 | 80 | 92 | 25 | 800 | 1200 | 35 |
1.8 | 57 | 80 | 92 | 25 | 700 | 1260 | 40 |
2.0 | 60 | 80 | 92 | 23 | 650 | 1300 | 45 |
3.0 | 73 | 80 | 92 | 22 | 500 | 1500 | 50 |
Un=8000V.DC | |||||||
Ka mana (μF) | φD (mm) | L(mm) | L1(mm) | ESL(nH) | dv/dt(V/μS) | Ipk(A) | Irms(A) |
0.33 | 35 | 90 | 102 | 30 | 1100 | 363 | 25 |
0.47 | 41 | 90 | 102 | 28 | 1000 | 470 | 30 |
0.68 | 49 | 90 | 102 | 28 | 850 | 578 | 35 |
1 | 60 | 90 | 102 | 25 | 800 | 800 | 40 |
1.5 | 72 | 90 | 102 | 25 | 700 | 1050 | 45 |
2.0 | 83 | 90 | 102 | 25 | 650 | 1300 | 50 |
Un=10000V.DC | |||||||
Kahakaha (μF) | φD (mm) | L(mm) | L1(mm) | ESL(nH) | dv/dt(V/μS) | Ipk(A) | Irms(A) |
0.33 | 45 | 114 | 123 | 35 | 1500 | 495 | 30 |
0.47 | 54 | 114 | 123 | 35 | 1300 | 611 | 35 |
0.68 | 65 | 114 | 123 | 35 | 1200 | 816 | 40 |
1 | 78 | 114 | 123 | 30 | 1000 | 1000 | 55 |
1.5 | 95 | 114 | 123 | 30 | 800 | 1200 | 70 |
Nā kiʻi kikoʻī huahana:
Alakaʻi Huahana Pili:
Hele mai ka maikaʻi kiʻekiʻe i ka 1st;ʻO ke kākoʻo ka mea mua;ʻO ka hui pū ʻana "ʻo kā mākou ʻoihana ʻoihana liʻiliʻi e nānā mau ʻia a hahai ʻia e kā mākou hui no Factory e hāʻawi pololei iā Resonant Capacitor - High-Current Film Capacitor Snubber for Welding Machine (SMJ-TC) - CRE , E hāʻawi ka huahana i nā wahi āpau. honua, e like me: Netherlands, Saudi Arabia, Angola, Hoʻokomo mākou i ka maikaʻi o ka huahana a me nā pono o ka mea kūʻai aku i kahi mua. Inā he koi kāu, e hana pū kāua e loaʻa ka holomua.
Ua hana mākou me nā ʻoihana he nui, akā ʻo kēia ka manawa maikaʻi loa, wehewehe kikoʻī, hāʻawi manawa kūpono a me ka maikaʻi kūpono, maikaʻi! Na Lydia mai El Salvador - 2018.06.05 13:10